Next-generation NVD inspection solution for patterned wafers

Posted In: Semiconductor Manufacturing

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Qcept Technologies Inc. introduced its latest non-visual defect (NVD) inspection system—the ChemetriQ 5000. Providing NVD inspection on both patterned and unpatterned wafers, the ChemetriQ 5000 can be used for a wide range of tool and line monitoring applications to increase yield learning rates and enable higher sustainable yields.

The ChemetriQ 5000 platform provides rapid, full-wafer, inline detection of NVDs—such as organic and inorganic residues, metallic contaminants, and process-induced charging—which can lead to significant yield loss and are undetectable by optical inspection systems. It accomplishes this by employing a non-destructive technology that detects work function variations on the wafer's surface. Enhanced detection algorithms and tighter positional accuracy further augment the performance of the ChemetriQ 5000 to capture a variety of NVDs on both patterned and unpatterned wafers.

The ChemetriQ platform is sensitive to 5E9 atoms/cm2, which exceeds the requirements outlined in the International Technology Roadmap for Semiconductors (ITRS) for metallic contamination detection down to the 22-nm node.

Qcept Technologies Inc., www.qceptech.com

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