Qcept Technologies Inc. introduced its latest non-visual defect (NVD)
inspection system—the ChemetriQ 5000. Providing NVD inspection on both
patterned and unpatterned wafers, the ChemetriQ 5000 can be used for a wide
range of tool and line monitoring applications to increase yield learning rates
and enable higher sustainable yields.
The ChemetriQ 5000 platform provides rapid, full-wafer, inline detection of
NVDs—such as organic and inorganic residues, metallic contaminants, and
process-induced charging—which can lead to significant yield loss and are
undetectable by optical inspection systems. It accomplishes this by employing a
non-destructive technology that detects work function variations on the wafer's
surface. Enhanced detection algorithms and tighter positional accuracy further
augment the performance of the ChemetriQ 5000 to capture a variety of NVDs on
both patterned and unpatterned wafers.
The ChemetriQ platform is sensitive to 5E9 atoms/cm2, which
exceeds the requirements outlined in the International Technology Roadmap for
Semiconductors (ITRS) for metallic contamination detection down to the 22-nm
node.
Qcept
Technologies Inc.,
www.qceptech.com
